This Small Business Innovation Research Phase I project will develop a compact, table top, high-throughput nano-photolithography tool capable to print arrays of periodic features of arbitrary shape with sub-50 nm feature size defect-free. The innovative printing tool makes use of the Talbot effect, in which a coherently illuminated periodic diffractive structure (the Talbot mask) self-images by diffraction at planes known as Talbot planes without the use of any optics. Coherent illumination with extreme ultraviolet (EUV) laser light allows replication of masks containing nano-scale patterns onto photoresist. The method is non-contact and it is defect-free as any defect in the mask is averaged over the entire imaging field. The method uses a high average power, highly coherent table-top EUV laser commercialized by XUV Lasers Inc. The proposed compact tool will bring cost-effective nano-patterning capabilities to small size companies and university laboratories.
The broader impact/commercial potential of this project is in its ability to simplify the printing of periodic arrays of nanostructures. The table-top nano-printing EUV system will significantly enhance the capabilities to fabricate nanostructures in an affordable and versatile way. Its main attributes are that it offers defect-free printing, high through-put, and cost-effectiveness in the printing of nanostructures. These capabilities could have a broad impact in various disciplines, including material science, advanced optical component manufacturing, nanoelectronics, biology and medicine. The nano-printing tool is aimed at markets that require the printing of templates for nanostructure growth, chemical micro-sensors, gas separation membranes, and the fabrication of high density diffraction gratings, short wavelength light polarizers, and plasmonic structures.
Normal 0 false false false EN-US X-NONE X-NONE The ability to fabricate periodic nanostructures with feature size below 100 nm is critical for many nanoscience and nanotechnology applications. Through this small business innovation research Phase I project we demonstrated a compact, high-throughput nano-lithography tool capable to print arrays of periodic features of arbitrary motifs with sub-50 nm feature size defect-free. Our method is unique in that it combines the use a compact extreme ultraviolet (EUV) laser operating at 46.9 nm wavelength, 10x shorter than visible light with a non-contact printing method, EUV Talbot lithography, that is inherently error-free to enable printing of sub-50 nm features with a single laser shot exposure. We successfully demonstrated: a) printing of arrays of periodic nanostructures without defects; b) printing of 40 nm features by using double exposure; c) stitching capabilities that allowed for an to increase in the printed area to 1mm x 1 mm and d) increased throughput as nanopatterns can be printed with a single laser shot using high sensitivity EUV resists. The proposed table-top nano-printing tool offers a high throughput, low cost, versatile methodology to fabricate nanostructures in a variety of substrates. The proposed nano-printing tool offers a perfect platform for the fabrication of nano-seals for brand protection applications. In addition, it has applications in the printing of templates for nanostructure growth suitable for chemical microsensors, gas separation membranes, and plasmonic structures. The project contributed to educate undergraduate and graduate students. The project provided the opportunity for XUV Lasers, a small startup company in CO, to demonstrate proof-of-principle on a nanopatterning technology it plans to commercialize.
