In previous years we developed fabrication technologies of nanometric structures having high aspect ratios for producing hard x-ray phase gratings of 200 and 400 nm periods. This year we continue to enlarge area of the gratings and develop more reliable metallization processes which are necessary for medical x-ray energies. We also developed a prototype x-ray lens out of polymer material with a novel fabrication method. Micro and nano fabrication development is costly in nature, but enables new ways to do x-ray imaging that would not have been possible without them.
| Mirzaeimoghri, Mona; Morales Martinez, Alejandro; Panna, Alireza et al. (2018) Nano-printed miniature compound refractive lens for desktop hard x-ray microscopy. PLoS One 13:e0203319 |
| Miao, Houxun; Chen, Lei; Mirzaeimoghri, Mona et al. (2016) Cryogenic Etching of High Aspect Ratio 400 nm Pitch Silicon Gratings. J Microelectromech Syst 25:963-967 |
| Znati, Sami A; Chedid, Nicholas; Miao, Houxun et al. (2015) Electrodeposition of Gold to Conformally Fill High Aspect Ratio Nanometric Silicon Grating Trenches: A Comparison of Pulsed and Direct Current Protocols. J Surf Eng Mater Adv Technol 5:207-213 |
| Miao, Houxun; Gomella, Andrew A; Chedid, Nicholas et al. (2014) Fabrication of 200 nm period hard X-ray phase gratings. Nano Lett 14:3453-8 |
| Wen, Han; Wolfe, Douglas E; Gomella, Andrew A et al. (2013) Interferometric hard x-ray phase contrast imaging at 204 nm grating period. Rev Sci Instrum 84:013706 |
